# Block copolymer directed self-assembly enables sublithographic patterning for device fabrication

> The use of block copolymer self-assembly for device fabrication in the semiconductor industry has been envisioned for over a decade. Early works by the groups of Hawker, Russell, and Nealey [1-2] have shown a high degree of dimensional control of the self-assembled features over large areas with hig...

## Metadata
- Authors: H.‐S. Philip Wong, Chris Bencher, He Yi, Xinyu Bao, Li‐Wen Chang
- Journal: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
- Published: 2012-03-01
- DOI: https://doi.org/10.1117/12.918312
- Citations: 41
- Source: OpenAlex
- Access: Open Access

## Technology Hub
- Hub: Semiconductor Technology
- Discipline: Engineering / Materials Science
- Hub URL: https://science-database.com/technology/semiconductor
- Hub llms.txt: https://science-database.com/technology/semiconductor/llms.txt

## Abstract
The use of block copolymer self-assembly for device fabrication in the semiconductor industry has been envisioned for over a decade. Early works by the groups of Hawker, Russell, and Nealey [1-2] have shown a high degree of dimensional control of the self-assembled features over large areas with high degree of ordering. The exquisite dimensional control at nanometer-scale feature sizes is one of the most attractive properties of block copolymer self-assembly. At the same time, device and circuit fabrication for the semiconductor industry requires accurate placement of desired features at irregular positions on the chip. The need to coax the self-assembled features into circuit layout friendly location is a roadblock for introducing self-assembly into semiconductor manufacturing. Directed self-assembly (DSA) and the use of topography to direct the self-assembly (graphoepitaxy) have shown great promise in solving the placement problem [3-4]. In this paper, we review recent progress in using block copolymer directed self-assembly for patterning sub-20 nm contact holes for practical circuits.

## Links
- DOI: https://doi.org/10.1117/12.918312
- OpenAlex: https://openalex.org/W2068165923
- PDF: https://www.spiedigitallibrary.org/conference-proceedings-of-spie/8323/832303/Block-copolymer-directed-self-assembly-enables-sublithographic-patterning-for-device/10.1117/12.918312.pdf
- JSON API: https://science-database.com/api/v1/technology/semiconductor

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Paper ID: oa-W2068165923 | Hub: semiconductor