# Semiconductor Technology — science-database.com > Advanced semiconductor manufacturing and design. Covers chip fabrication below 3nm, EUV lithography, novel materials, chiplet architectures, and neuromorphic computing. - Discipline: Engineering / Materials Science - URL: https://science-database.com/technology/semiconductor - API: https://science-database.com/api/v1/technology/semiconductor - Last Updated: 2026-10-06T11:10:29.274Z - Articles Indexed: 15 ## Top Publications ### Nanoimprint lithography steppers for volume fabrication of leading-edge semiconductor integrated circuits - Authors: S. V. Sreenivasan - Journal: Microsystems & Nanoengineering - Date: 2017-09-25 - DOI: https://doi.org/10.1038/micronano.2017.75 - Citations: 229 - Source: OpenAlex - llms.txt: https://science-database.com/technology/semiconductor/paper/oa-W2757913998/llms.txt - Abstract: This article discusses the transition of a form of nanoimprint lithography technology, known as Jet and Flash Imprint Lithography (J-FIL), from research to a commercial fabrication infrastructure for leading-edge semiconductor integrated circuits (ICs). Leading-edge semiconductor lithography has som... ### Sub-10 nm fabrication: methods and applications - Authors: Yiqin Chen, Zhiwen Shu, Shi Zhang, Pei Zeng, Huikang Liang, Mengjie Zheng, Huigao Duan - Journal: International Journal of Extreme Manufacturing - Date: 2021-06-04 - DOI: https://doi.org/10.1088/2631-7990/ac087c - Citations: 209 - Source: OpenAlex - llms.txt: https://science-database.com/technology/semiconductor/paper/oa-W3166690669/llms.txt - Abstract: Abstract Reliable fabrication of micro/nanostructures with sub-10 nm features is of great significance for advancing nanoscience and nanotechnology. While the capability of current complementary metal-oxide semiconductor (CMOS) chip manufacturing can produce structures on the sub-10 nm scale, many e... ### On-chip growth of semiconductor metal oxide nanowires for gas sensors: A review - Authors: Chu Manh Hung, Dang Thi Thanh Le, Nguyen Van Hieu - Journal: Journal of Science Advanced Materials and Devices - Date: 2017-08-12 - DOI: https://doi.org/10.1016/j.jsamd.2017.07.009 - Citations: 109 - Source: OpenAlex - llms.txt: https://science-database.com/technology/semiconductor/paper/oa-W2744977531/llms.txt - Abstract: Semiconductor metal oxide nanowires (SMO-NWs) show great potential for novel gas sensor applications because of their distinct properties, such as a high surface area to volume aspect ratio, high crystallinity and perfect pathway for electron transfer (length of NW). SMO-NW sensors can be configured... ### Semiconductor nanowire plasmonic lasers - Authors: Chun Li, Zhen Liu, Jie Chen, Yan Na Gao, Meili Li, Qing Zhang - Journal: Nanophotonics - Date: 2018-06-01 - DOI: https://doi.org/10.1515/nanoph-2019-0206 - Citations: 48 - Source: OpenAlex - llms.txt: https://science-database.com/technology/semiconductor/paper/oa-W2982544440/llms.txt - Abstract: Abstract Semiconductor nanowires (NW) hold great promise for micro/nanolasers owing to their naturally formed resonant microcavity, tightly confined electromagnetic field, and outstanding capability of integration with planar waveguide for on‐chip optoelectronic applications. However, constrained by... ### Fabrication of Smart Chemical Sensors Based on Transition-Doped-Semiconductor Nanostructure Materials with µ-Chips - Authors: Mohammed Muzibur Rahman, Sher Bahadar Khan, Abdullah Mohamed Asiri - Journal: PLoS ONE - Date: 2014-01-13 - DOI: https://doi.org/10.1371/journal.pone.0085036 - Citations: 37 - Source: OpenAlex - llms.txt: https://science-database.com/technology/semiconductor/paper/oa-W2028530049/llms.txt - Abstract: Transition metal doped semiconductor nanostructure materials (Sb2O3 doped ZnO microflowers, MFs) are deposited onto tiny µ-chip (surface area, ∼0.02217 cm(2)) to fabricate a smart chemical sensor for toxic ethanol in phosphate buffer solution (0.1 M PBS). The fabricated chemi-sensor is also exhibite... ### Fabrication of Semiconductor Nanowires for Electronic Transport Measurements - Authors: A. Pfund, Ivan Shorubalko, Renaud Leturcq, Magnus T. Borgström, Fabian Gramm, Elisabeth A. Müller, K. Ensslin - Journal: CHIMIA International Journal for Chemistry - Date: 2006-11-29 - DOI: https://doi.org/10.2533/chimia.2006.729 - Citations: 22 - Source: OpenAlex - llms.txt: https://science-database.com/technology/semiconductor/paper/oa-W2049562185/llms.txt - Abstract: We report on epitaxial growth of InAs nanowires and the steps necessary to create devices for electrnic transport experiments. Growth conditions were found by the use of metal organic vapor phase epitaxy (MOVPE) resulting in nanowires with designable length and diameter. Electrical properties indica... ### Electrodeposition for the Fabrication of Copper Interconnection in Semiconductor Devices - Authors: Myung Jun Kim, Jae Jeong Kim - Journal: Korean Chemical Engineering Research - Date: 2014-02-01 - DOI: https://doi.org/10.9713/kcer.2014.52.1.26 - Citations: 21 - Source: OpenAlex - llms.txt: https://science-database.com/technology/semiconductor/paper/oa-W2025264359/llms.txt - Abstract: 전자 소자의 구리 금속 배선은 전해 도금을 포함한 다마신 공정을 통해 형성한다. 본 총설에서는 배선 형성을 위한 구리 전해 도금 및 수퍼필링 메카니즘에 대해 다루고자 한다. 수퍼필링 기술은 전해 도금의 전해질에 포함된 유기 첨가제의 영향에 의한 결과이며, 이는 유기 첨가제의 표면 덮임율을 조절하여 웨이퍼 위에 형성된 패턴의 바닥 면에서의 전해 도금 속도를 선택적으로 높임으로써 가능하다. 소자의 집적도를 높이기 위해 금속 배선의 크기는 계속적으로 감소하여 현재 그 폭이 수십 nm 수준으로 줄어들었다. 이러한 배선 폭의 감소는 구리 배... ### Biomimetic nanolithography and its application for biosensor chip fabrication - Authors: Hiroshi Matsui - Journal: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE - Date: 2010-02-11 - DOI: https://doi.org/10.1117/12.846434 - Citations: 2 - Source: OpenAlex - llms.txt: https://science-database.com/technology/semiconductor/paper/oa-W2013701281/llms.txt - Abstract: Various nano-structures and complex patterns have been fabricated by top-down or bottom-up approaches, which have own strength and weakness. Here we combined the top-down and the bottom-up fabrications to take advantages on both strengths. We demonstrated that two different ways of the top-down/bott... ### A Study of Nanometer Semiconductor Scaling Effects on Microelectronics Reliability - Authors: Mark White - Journal: University Libraries (University of Maryland) - Date: 2009-01-01 - Citations: 2 - Source: OpenAlex - llms.txt: https://science-database.com/technology/semiconductor/paper/oa-W122348984/llms.txt - Abstract: The desire to assess the reliability of emerging scaled microelectronics technologies through faster reliability trials and more accurate acceleration models is the precursor for further research and experimentation in this relevant field. The effect of semiconductor scaling on microelectronics prod... ### Rationale of the need to the development of semiconductor industry in Russia with the 28 nanometer semiconductor device fabrication node and below - Authors: Alena Vladimirovna Fomina, Viktoriia V. Frantsuzova, Ya I Petrenko, D V Kornachev, A R Avanesyan - Journal: IOP Conference Series Materials Science and Engineering - Date: 2019-04-16 - DOI: https://doi.org/10.1088/1757-899x/498/1/012043 - Citations: 1 - Source: OpenAlex - llms.txt: https://science-database.com/technology/semiconductor/paper/oa-W2937375035/llms.txt - Abstract: This article describes the systemic problem of the development of the Russian semiconductor industry due to the lack of national production of integrated microcircuits with topological standards below 65 nm. Here are the results of the analysis of the feasibility of production lines of integrated ci... ### Integrating AI into Semiconductor Design and Fabrication: Methodologies, Challenges and Future Prospects - Authors: Nuo Chen - Journal: ITM Web of Conferences - Date: 2025-01-01 - DOI: https://doi.org/10.1051/itmconf/20257803007 - Citations: 1 - Source: OpenAlex - llms.txt: https://science-database.com/technology/semiconductor/paper/oa-W4414070220/llms.txt - Abstract: Semiconductor chips underpin modern electronics, yet conventional design and fabrication methods face escalating costs and diminishing returns as device geometries shrink. This review surveys the integration of artificial intelligence (AI) across chip development workflows, categorizing methodologie... ### Charting Progress In Semiconductor Fabrication - Authors: STEPHEN C. STINSON - Journal: Chemical & Engineering News - Date: 1999-09-13 - DOI: https://doi.org/10.1021/cen-v077n037.p037 - Source: OpenAlex - llms.txt: https://science-database.com/technology/semiconductor/paper/oa-W2321204170/llms.txt - Abstract: From the ACS meeting Electronic semiconductor devices are ubiquitous—from computers to cars to industrial process control. At a symposium on polymers for micropatterning and nanopatterning sponsored by the Division of Polymeric Materials: Science & Engineering, chemists reported progress in the fabr... ### Revitalizing U.S. Semiconductor Manufacturing: The Strategic Impact of the CHIPS Act on Advanced Packaging and Fabrication Technologies - Authors: Shubham Rajendra Ekatpure - Journal: International Journal of Science and Research (IJSR) - Date: 2024-08-05 - DOI: https://doi.org/10.21275/sr24824030107 - Source: OpenAlex - llms.txt: https://science-database.com/technology/semiconductor/paper/oa-W4401964319/llms.txt - Abstract: The semiconductor industry is integral to modern electronics, yet the United States has seen a decline in its manufacturing capabilities due to offshoring. The CHIPS Act of 2022 aims to revitalize U.S. semiconductor manufacturing by providing substantial funding and incentives. This paper explores t... ### Methods for self-fabrication chips - Authors: Jeremy A. Levitan - Journal: DSpace@MIT (Massachusetts Institute of Technology) - Date: 2000-01-01 - Source: OpenAlex - llms.txt: https://science-database.com/technology/semiconductor/paper/oa-W2252330829/llms.txt - Abstract: Thesis (S.M.)--Massachusetts Institute of Technology, Dept. of Mechanical Engineering, February 2001.... ### A Comparative Review of RIE, ICP-RIE, and ALE: Dry Etching Technologies for Advanced Semiconductor Fabrication - Authors: Qiange Ren - Journal: Theoretical and Natural Science - Date: 2025-08-27 - DOI: https://doi.org/10.54254/2753-8818/2025.ad26235 - Source: OpenAlex - llms.txt: https://science-database.com/technology/semiconductor/paper/oa-W4413737602/llms.txt - Abstract: As the semiconductor industry continues to evolve rapidly to meet the growing demand for high-performance, low-power chips driven by technologies such as artificial intelligence (AI) and 5G, process nodes have progressed to sub-nanometer scales. This advancement introduces increased challenges in te... --- Generated by science-database.com — The Knowledge Interface Full data available at: https://science-database.com/api/v1/technology/semiconductor