--- title: "Semiconductor Technology" slug: "semiconductor" discipline: "Engineering / Materials Science" description: "Advanced semiconductor manufacturing and design. Covers chip fabrication below 3nm, EUV lithography, novel materials, chiplet architectures, and neuromorphic computing." icon: "💻" url: "https://science-database.com/technology/semiconductor" api: "https://science-database.com/api/v1/technology/semiconductor" llms_txt: "https://science-database.com/technology/semiconductor/llms.txt" articles_indexed: 15 last_updated: "2026-09-08T05:41:21.192Z" search_terms: - "semiconductor chip nanometer fabrication" - "EUV lithography advanced packaging" - "neuromorphic computing chip design" source: "science-database.com" license: "metadata CC0, abstracts belong to respective publishers" --- # Semiconductor Technology Advanced semiconductor manufacturing and design. Covers chip fabrication below 3nm, EUV lithography, novel materials, chiplet architectures, and neuromorphic computing. **Discipline:** Engineering / Materials Science **Indexed Papers:** 15 **Last Updated:** 2026-09-08 ## Top Publications Ranked by citation impact across Semantic Scholar, OpenAlex & arXiv. ### Plasmonics: Merging Photonics and Electronics at Nanoscale Dimensions - **Authors:** Ekmel Özbay - **Journal:** Science - **Published:** 2006-01-12 - **DOI:** [10.1126/science.1114849](https://doi.org/10.1126/science.1114849) - **Citations:** 4,565 - **Source:** OpenAlex - **Access:** Open Access - **PDF:** [Download](https://repository.bilkent.edu.tr/bitstreams/93834136-40ff-41cf-b04d-974f7d8e4779/download) - **llms.txt:** [View](https://science-database.com/technology/semiconductor/paper/oa-W2142269155/llms.txt) > Electronic circuits provide us with the ability to control the transport and storage of electrons. However, the performance of electronic circuits is now becoming rather limited when digital information needs to be sent from one point to another. Photonics offers an effective solution to this problem by implementing optical communication systems based on optical fibers and photonic circuits. Unfor... ### Transport phenomena in nanofluidics - **Authors:** Reto B. Schoch, Jongyoon Han, Philippe Renaud - **Journal:** Reviews of Modern Physics - **Published:** 2008-07-17 - **DOI:** [10.1103/revmodphys.80.839](https://doi.org/10.1103/revmodphys.80.839) - **Citations:** 1,917 - **Source:** OpenAlex - **Access:** Open Access - **PDF:** [Download](http://link.aps.org/pdf/10.1103/RevModPhys.80.839) - **llms.txt:** [View](https://science-database.com/technology/semiconductor/paper/oa-W2130869501/llms.txt) > The transport of fluid in and around nanometer-sized objects with at least one characteristic dimension below $100\phantom{\rule{0.3em}{0ex}}\mathrm{nm}$ enables the occurrence of phenomena that are impossible at bigger length scales. This research field was only recently termed nanofluidics, but it has deep roots in science and technology. Nanofluidics has experienced considerable growth in recen... ### Humidity Sensors Principle, Mechanism, and Fabrication Technologies: A Comprehensive Review - **Authors:** Hamid Farahani, Rahman Wagiran, Mohd Nizar Hamidon - **Journal:** Sensors - **Published:** 2014-04-30 - **DOI:** [10.3390/s140507881](https://doi.org/10.3390/s140507881) - **Citations:** 1,274 - **Source:** OpenAlex - **Access:** Open Access - **PDF:** [Download](https://www.mdpi.com/1424-8220/14/5/7881/pdf?version=1403353770) - **llms.txt:** [View](https://science-database.com/technology/semiconductor/paper/oa-W2001086979/llms.txt) > Humidity measurement is one of the most significant issues in various areas of applications such as instrumentation, automated systems, agriculture, climatology and GIS. Numerous sorts of humidity sensors fabricated and developed for industrial and laboratory applications are reviewed and presented in this article. The survey frequently concentrates on the RH sensors based upon their organic and i... ### Plasmon slot waveguides: Towards chip-scale propagation with subwavelength-scale localization - **Authors:** Jennifer A. Dionne, Luke A. Sweatlock, Harry A. Atwater, Albert Polman - **Journal:** Physical Review B - **Published:** 2006-01-05 - **DOI:** [10.1103/physrevb.73.035407](https://doi.org/10.1103/physrevb.73.035407) - **Citations:** 1,153 - **Source:** OpenAlex - **Access:** Open Access - **PDF:** [Download](http://link.aps.org/pdf/10.1103/PhysRevB.73.035407) - **llms.txt:** [View](https://science-database.com/technology/semiconductor/paper/oa-W2051597024/llms.txt) > We present a numerical analysis of surface plasmon waveguides exhibiting both long-range propagation and spatial confinement of light with lateral dimensions of less than 10% of the free-space wavelength. Attention is given to characterizing the dispersion relations, wavelength-dependent propagation, and energy density decay in two-dimensional $\mathrm{Ag}∕\mathrm{Si}{\mathrm{O}}_{2}∕\mathrm{Ag}$ ... ### Gas-assisted focused electron beam and ion beam processing and fabrication - **Authors:** Ivo Utke, P. Hoffmann, J. Melngailis - **Journal:** Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena - **Published:** 2008-07-01 - **DOI:** [10.1116/1.2955728](https://doi.org/10.1116/1.2955728) - **Citations:** 1,026 - **Source:** OpenAlex - **Access:** Open Access - **PDF:** [Download](https://avs.scitation.org/doi/pdf/10.1116/1.2955728) - **llms.txt:** [View](https://science-database.com/technology/semiconductor/paper/oa-W1973381743/llms.txt) > Beams of electrons and ions are now fairly routinely focused to dimensions in the nanometer range. Since the beams can be used to locally alter material at the point where they are incident on a surface, they represent direct nanofabrication tools. The authors will focus here on direct fabrication rather than lithography, which is indirect in that it uses the intermediary of resist. In the case of... ### Microelectromechanical systems (MEMS): fabrication, design and applications - **Authors:** Jack W. Judy - **Journal:** Smart Materials and Structures - **Published:** 2001-11-28 - **DOI:** [10.1088/0964-1726/10/6/301](https://doi.org/10.1088/0964-1726/10/6/301) - **Citations:** 825 - **Source:** OpenAlex - **Access:** Open Access - **PDF:** [Download](https://iopscience.iop.org/article/10.1088/0964-1726/10/6/301/pdf) - **llms.txt:** [View](https://science-database.com/technology/semiconductor/paper/oa-W2126326964/llms.txt) > Micromachining and micro-electromechanical system (MEMS) technologies can be used to produce complex structures, devices and systems on the scale of micrometers. Initially micromachining techniques were borrowed directly from the integrated circuit (IC) industry, but now many unique MEMS-specific micromachining processes are being developed. In MEMS, a wide variety of transduction mechanisms can b... ### Organic Lasers: Recent Developments on Materials, Device Geometries, and Fabrication Techniques - **Authors:** Alexander J. C. Kuehne, Malte C. Gather - **Journal:** Chemical Reviews - **Published:** 2016-08-08 - **DOI:** [10.1021/acs.chemrev.6b00172](https://doi.org/10.1021/acs.chemrev.6b00172) - **Citations:** 792 - **Source:** OpenAlex - **Access:** Open Access - **PDF:** [Download](https://research-repository.st-andrews.ac.uk/bitstream/10023/11411/1/Kuehne_2016_Organic_ChemRev_AAM.pdf) - **llms.txt:** [View](https://science-database.com/technology/semiconductor/paper/oa-W2498063088/llms.txt) > Organic dyes have been used as gain medium for lasers since the 1960s, long before the advent of today's organic electronic devices. Organic gain materials are highly attractive for lasing due to their chemical tunability and large stimulated emission cross section. While the traditional dye laser has been largely replaced by solid-state lasers, a number of new and miniaturized organic lasers have... ### Synthesis, assembly and applications of semiconductor nanomembranes - **Authors:** John A. Rogers, M. G. Lagally, Ralph G. Nuzzo - **Journal:** Nature - **Published:** 2011-08-30 - **DOI:** [10.1038/nature10381](https://doi.org/10.1038/nature10381) - **Citations:** 713 - **Source:** OpenAlex - **Access:** Open Access - **PDF:** [Download](https://www.osti.gov/servlets/purl/1876405) - **llms.txt:** [View](https://science-database.com/technology/semiconductor/paper/oa-W1969448305/llms.txt) ### Large-scale quantum-emitter arrays in atomically thin semiconductors - **Authors:** Carmen Palacios-Berraquero, Dhiren M. Kara, Alejandro R.‐P. Montblanch, Matteo Barbone, Pawel Latawiec, Duhee Yoon, Anna K. Ott, Marko Lončar, Andrea C. Ferrari, Mete Atatüre - **Journal:** Nature Communications - **Published:** 2017-05-22 - **DOI:** [10.1038/ncomms15093](https://doi.org/10.1038/ncomms15093) - **Citations:** 623 - **Source:** OpenAlex - **Access:** Open Access - **PDF:** [Download](https://www.nature.com/articles/ncomms15093.pdf) - **llms.txt:** [View](https://science-database.com/technology/semiconductor/paper/oa-W2519556550/llms.txt) > Quantum light emitters have been observed in atomically thin layers of transition metal dichalcogenides. However, they are found at random locations within the host material and usually in low densities, hindering experiments aiming to investigate this new class of emitters. Here, we create deterministic arrays of hundreds of quantum emitters in tungsten diselenide and tungsten disulphide monolaye... ### Silicon Device Scaling to the Sub-10-nm Regime - **Authors:** M. Ieong, B. Doris, J. Kedzierski, K. Rim, Min Yang - **Journal:** Science - **Published:** 2004-12-16 - **DOI:** [10.1126/science.1100731](https://doi.org/10.1126/science.1100731) - **Citations:** 573 - **Source:** OpenAlex - **llms.txt:** [View](https://science-database.com/technology/semiconductor/paper/oa-W2007104515/llms.txt) > In the next decade, advances in complementary metal-oxide semiconductor fabrication will lead to devices with gate lengths (the region in the device that switches the current flow on and off) below 10 nanometers (nm), as compared with current gate lengths in chips that are now about 50 nm. However, conventional scaling will no longer be sufficient to continue device performance by creating smaller... ### On-chip light sources for silicon photonics - **Authors:** Zhiping Zhou, Bing Yin, Jürgen Michel - **Journal:** Light Science & Applications - **Published:** 2015-11-20 - **DOI:** [10.1038/lsa.2015.131](https://doi.org/10.1038/lsa.2015.131) - **Citations:** 572 - **Source:** OpenAlex - **Access:** Open Access - **PDF:** [Download](https://www.nature.com/articles/lsa2015131.pdf) - **llms.txt:** [View](https://science-database.com/technology/semiconductor/paper/oa-W2336371078/llms.txt) > Serving as the electrical to optical converter, the on-chip silicon light source is an indispensable component of silicon photonic technologies and has long been pursued. Here, we briefly review the history and recent progress of a few promising contenders for on-chip light sources in terms of operating wavelength, pump condition, power consumption, and fabrication process. Additionally, the perfo... ### Nanopore Fabrication by Controlled Dielectric Breakdown - **Authors:** Harold Kwok, Kyle Briggs, Vincent Tabard‐Cossa - **Journal:** PLoS ONE - **Published:** 2014-03-21 - **DOI:** [10.1371/journal.pone.0092880](https://doi.org/10.1371/journal.pone.0092880) - **Citations:** 471 - **Source:** OpenAlex - **Access:** Open Access - **PDF:** [Download](https://journals.plos.org/plosone/article/file?id=10.1371/journal.pone.0092880&type=printable) - **llms.txt:** [View](https://science-database.com/technology/semiconductor/paper/oa-W2007138906/llms.txt) > Nanofabrication techniques for achieving dimensional control at the nanometer scale are generally equipment-intensive and time-consuming. The use of energetic beams of electrons or ions has placed the fabrication of nanopores in thin solid-state membranes within reach of some academic laboratories, yet these tools are not accessible to many researchers and are poorly suited for mass-production. He... ### A microprocessor based on a two-dimensional semiconductor - **Authors:** Stefan Wachter, Dmitry K. Polyushkin, Ole Bethge, Thomas Mueller - **Journal:** Nature Communications - **Published:** 2017-04-11 - **DOI:** [10.1038/ncomms14948](https://doi.org/10.1038/ncomms14948) - **Citations:** 416 - **Source:** OpenAlex - **Access:** Open Access - **PDF:** [Download](https://www.nature.com/articles/ncomms14948.pdf) - **llms.txt:** [View](https://science-database.com/technology/semiconductor/paper/oa-W2560834721/llms.txt) > The advent of microcomputers in the 1970s has dramatically changed our society. Since then, microprocessors have been made almost exclusively from silicon, but the ever-increasing demand for higher integration density and speed, lower power consumption and better integrability with everyday goods has prompted the search for alternatives. Germanium and III-V compound semiconductors are being consid... ### Nanoimprint lithography steppers for volume fabrication of leading-edge semiconductor integrated circuits - **Authors:** S. V. Sreenivasan - **Journal:** Microsystems & Nanoengineering - **Published:** 2017-09-25 - **DOI:** [10.1038/micronano.2017.75](https://doi.org/10.1038/micronano.2017.75) - **Citations:** 225 - **Source:** OpenAlex - **Access:** Open Access - **PDF:** [Download](https://www.nature.com/articles/micronano201775.pdf) - **llms.txt:** [View](https://science-database.com/technology/semiconductor/paper/oa-W2757913998/llms.txt) > This article discusses the transition of a form of nanoimprint lithography technology, known as Jet and Flash Imprint Lithography (J-FIL), from research to a commercial fabrication infrastructure for leading-edge semiconductor integrated circuits (ICs). Leading-edge semiconductor lithography has some of the most aggressive technology requirements, and has been a key driver in the 50-year history o... ### Sub-10 nm fabrication: methods and applications - **Authors:** Yiqin Chen, Zhiwen Shu, Shi Zhang, Pei Zeng, Huikang Liang, Mengjie Zheng, Huigao Duan - **Journal:** International Journal of Extreme Manufacturing - **Published:** 2021-06-04 - **DOI:** [10.1088/2631-7990/ac087c](https://doi.org/10.1088/2631-7990/ac087c) - **Citations:** 209 - **Source:** OpenAlex - **Access:** Open Access - **PDF:** [Download](https://iopscience.iop.org/article/10.1088/2631-7990/ac087c/pdf) - **llms.txt:** [View](https://science-database.com/technology/semiconductor/paper/oa-W3166690669/llms.txt) > Abstract Reliable fabrication of micro/nanostructures with sub-10 nm features is of great significance for advancing nanoscience and nanotechnology. While the capability of current complementary metal-oxide semiconductor (CMOS) chip manufacturing can produce structures on the sub-10 nm scale, many emerging applications, such as nano-optics, biosensing, and quantum devices, also require ultrasmall ... --- *Generated by [science-database.com](https://science-database.com) — The Knowledge Interface* *Full data available via [JSON API](https://science-database.com/api/v1/technology/semiconductor)*